Invention Grant
- Patent Title: Polishing composition for magnetic disc substrate
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Application No.: US15684543Application Date: 2017-08-23
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Publication No.: US10233358B2Publication Date: 2019-03-19
- Inventor: Junichiro Ando
- Applicant: YAMAGUCHI SEIKEN KOGYO CO., LTD.
- Applicant Address: JP
- Assignee: YAMAGUCHI SEIKEN KOGYO CO., LTD.
- Current Assignee: YAMAGUCHI SEIKEN KOGYO CO., LTD.
- Current Assignee Address: JP
- Agency: Bracewell LLP
- Agent Brad Y. Chin
- Priority: JP2016-162730 20160823
- Main IPC: G09G1/02
- IPC: G09G1/02 ; G09G1/16 ; C09G1/16 ; C09G1/02 ; G11B5/84
Abstract:
Embodiments relate to a polishing composition for a magnetic disk substrate, where the polishing composition contains colloidal silica, a water-soluble polymer compound, and water. According to at least one embodiment, the water-soluble polymer compound has a weight average molecular weight of 20,000 to 10,000,000 and a concentration of 0.0001 to 2.0% by mass.
Public/Granted literature
- US20180057712A1 POLISHING COMPOSITION FOR MAGNETIC DISC SUBSTRATE Public/Granted day:2018-03-01
Information query
