Invention Grant
- Patent Title: Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
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Application No.: US14751669Application Date: 2015-06-26
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Publication No.: US10234759B2Publication Date: 2019-03-19
- Inventor: Takeshi Kawabata , Hiroo Takizawa , Akinori Shibuya , Akiyoshi Goto , Masafumi Kojima , Keita Kato
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Minato-Ku, Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Minato-Ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2012-284642 20121227
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; C07D217/06 ; C07D333/48 ; C07D333/46 ; C07D333/76 ; C07D335/02 ; C07D295/185 ; C07D327/06 ; C07C309/12 ; C07C309/29 ; C07C309/17 ; C07C309/06 ; C07C311/48 ; C07C317/04 ; C07C381/12 ; C07J9/00 ; C07J17/00 ; C07J31/00 ; G03F7/038

Abstract:
Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group).
Public/Granted literature
Information query
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