Invention Grant
- Patent Title: Liquid chemical for forming protecting film
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Application No.: US15264776Application Date: 2016-09-14
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Publication No.: US10236175B2Publication Date: 2019-03-19
- Inventor: Masanori Saito , Shinobu Arata , Takashi Saio , Soichi Kumon , Hidehisa Nanai , Yoshinori Akamatsu
- Applicant: Central Glass Company, Limited
- Applicant Address: JP Ube-shi
- Assignee: Central Glass Company, Limited
- Current Assignee: Central Glass Company, Limited
- Current Assignee Address: JP Ube-shi
- Agency: Crowell & Moring LLP
- Priority: JP2009-248133 20091028; JP2010-018001 20100129; JP2010-020950 20100202; JP2010-039400 20100224; JP2010-039404 20100224; JP2010-088569 20100407; JP2010-093223 20100414; JP2010-120276 20100526; JP2010-228652 20101008
- Main IPC: C11D11/00
- IPC: C11D11/00 ; H01L21/02 ; H01L21/027 ; C11D1/00 ; C11D1/04 ; C11D1/40 ; H01L21/306 ; H01L21/311

Abstract:
Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.
Public/Granted literature
- US20170004963A1 Liquid Chemical for Forming Protecting Film Public/Granted day:2017-01-05
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