Invention Grant
- Patent Title: Element chip manufacturing method
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Application No.: US15594696Application Date: 2017-05-15
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Publication No.: US10236266B2Publication Date: 2019-03-19
- Inventor: Atsushi Harikai , Shogo Okita , Akihiro Itou , Katsumi Takano , Mitsuru Hiroshima
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: Pearne & Gordon LLP
- Priority: JP2016-107917 20160530
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L21/67 ; H01L21/687 ; H01L23/498 ; H05K13/04 ; H01L23/00 ; B44C1/22

Abstract:
An element chip manufacturing method includes a preparation process of preparing a substrate which includes a first surface having an exposed bump and a second surface opposite to the first surface and includes a plurality of element regions defined by dividing regions, a bump embedding process of embedding at least a head top part of the bump into the adhesive layer, a mask forming process of forming a mask in the second surface. The method for manufacturing the element chip includes a holding process of arranging the first surface to oppose a holding tape supported on a frame and holding the substrate on the holding tape, a placement process of placing the substrate on a stage provided inside of a plasma processing apparatus through the holding tape, after the mask forming process and the holding process.
Public/Granted literature
- US20170345781A1 ELEMENT CHIP MANUFACTURING METHOD Public/Granted day:2017-11-30
Information query
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