A manufacturing method of a display device comprises steps: a lining layer is formed on an array substrate; a conduction layer is formed on the array substrate, wherein the conduction layer partially covers a surface of said lining layer, wherein said conduction layer refers to a second metal layer, a surface of said array substrate is also provided with a first metal layer connected with a common electrode of said array substrate and an indium tin oxide layer connected with said first metal layer, and said second metal layer is indirectly connected with said common electrode through connecting with said indium tin oxide layer; and a color filter substrate is enabled to abut pat of the conduction layer covering the surface of said lining layer, so that said conduction layer being conductive with said array substrate and said color filter substrate.