Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15901446Application Date: 2018-02-21
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Publication No.: US10236440B2Publication Date: 2019-03-19
- Inventor: Takaaki Hioka
- Applicant: ABLIC Inc.
- Applicant Address: JP Chiba-Shi
- Assignee: ABLIC INC.
- Current Assignee: ABLIC INC.
- Current Assignee Address: JP Chiba-Shi
- Agency: Brinks Gilson & Lione
- Priority: JP2017-038543 20170301
- Main IPC: H01L43/06
- IPC: H01L43/06 ; H01L27/22 ; H01L43/04 ; G01R33/07

Abstract:
The vertical Hall element includes: a second conductivity type semiconductor layer; electrodes aligned along a straight line in a surface of the semiconductor layer, and each include a second conductivity type impurity region that is higher in concentration than semiconductor layer; and first conductivity type electrode isolation diffusion layers isolating the electrodes from one another, each of the electrode isolation diffusion layers being provided between each pair of the electrodes in the surface of the semiconductor layer, the electrodes including an electrode that functions as a drive current supply electrode and an electrode that functions as a Hall voltage output electrode, the drive current supply electrode and the Hall voltage output electrode being arranged alternately, the Hall voltage output electrode having a first depth, the drive current supply electrode having a second depth that is larger than the first depth and a depth of the electrode isolation diffusion layers.
Public/Granted literature
- US20180254408A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-09-06
Information query
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