A metrological apparatus (15) is disposed for adjustment of an attitude of a workpiece (16) having an arcuate upper surface (17) relative to a rotary axis (C) of the metrological apparatus (15). The workpiece (16) is brought into a first rotary position (c1). A plurality of measured points within a measuring plane on the upper surface (17) is recorded. The workpiece (16) is moved into a further rotary position (c2) about the rotary axis (C), and again measured points in the measuring plane (E) on the upper surface (17) of the workpiece (16) are recorded. Based on these recorded measured points, the actual attitude (Li) of the workpiece (16) deviation from a specified target attitude (Ls) are determined. Adjustment parameters are determined, and an adjustment assembly (24) of the metrological apparatus (15) is activated as a function of the calculated adjustment parameters to adjust the workpiece (16).