Invention Grant
- Patent Title: Liquid discharge apparatus and maintenance method for the liquid discharge apparatus
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Application No.: US15660696Application Date: 2017-07-26
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Publication No.: US10239318B2Publication Date: 2019-03-26
- Inventor: Hitoshi Takaai , Shunsuke Watanabe , Shingo Tomimatsu , Kohei Yuwaki
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2016-157193 20160810
- Main IPC: B41J2/165
- IPC: B41J2/165 ; B41J2/14 ; B41J2/175

Abstract:
A liquid discharge apparatus includes a plurality of pressure chambers that generate a pressure for discharging a liquid, a plurality of nozzles that communicate individually with the pressure chambers and that discharge the liquid, a common liquid chamber that includes a plurality of supply openings and that has, at an end portion side in an arrangement direction of the supply openings, a region in which flow speed of the liquid flowing toward the supply openings is higher than in another region, and a controller that controls a maintenance by expelling the liquid from the nozzles. During the maintenance, the controller controls expelling the liquid from a first nozzle to a second nozzle that is one of nozzles located on the end portion side of the first nozzle in the arrangement direction of the supply openings, in an order of the first nozzle to the second nozzle.
Public/Granted literature
- US20180043690A1 LIQUID DISCHARGE APPARATUS AND MAINTENANCE METHOD FOR THE LIQUID DISCHARGE APPARATUS Public/Granted day:2018-02-15
Information query
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