Invention Grant
- Patent Title: Method of producing glass substrate and glass substrate
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Application No.: US15730448Application Date: 2017-10-11
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Publication No.: US10239783B2Publication Date: 2019-03-26
- Inventor: Hiroshi Hanekawa , Nobutaka Aomine , Yuki Aoshima , Hirotomo Kawahara , Kazunobu Maeshige
- Applicant: Asahi Glass Company, Limited
- Applicant Address: JP Tokyo
- Assignee: AGC INC.
- Current Assignee: AGC INC.
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2012-118997 20120524
- Main IPC: H05H1/24
- IPC: H05H1/24 ; C03C17/245 ; C23C16/40 ; G02B1/11 ; G02B5/08 ; G02B5/20 ; C03C17/34 ; C03C17/36

Abstract:
A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm−1 to 3800 cm−1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.
Public/Granted literature
- US20180044229A1 METHOD OF PRODUCING GLASS SUBSTRATE AND GLASS SUBSTRATE Public/Granted day:2018-02-15
Information query
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