Invention Grant
- Patent Title: Anode holder and plating apparatus
-
Application No.: US15118036Application Date: 2015-02-05
-
Publication No.: US10240247B2Publication Date: 2019-03-26
- Inventor: Mitsutoshi Yahagi , Masaaki Kimura , Junichiro Tsujino
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Baker & Hostetler LLP
- Priority: JP2014-023477 20140210
- International Application: PCT/JP2015/053178 WO 20150205
- International Announcement: WO2015/119182 WO 20150813
- Main IPC: C25D17/00
- IPC: C25D17/00 ; C25D17/10 ; C25D17/04 ; C25D17/06

Abstract:
To provide an anode holder and a plating apparatus including the same, the anode holder being configured to prevent additives and black films from spreading by moving between an internal space in which an anode is provided and an external space.An anode holder 60 according to the present invention includes: an internal space 61 that houses an anode therein; a diaphragm configured so as to cover a front face of the internal space 61; a hole 71 that is formed on an external surface of the anode holder and which communicates with the internal space 61; and a valve 91 that seals the hole 71 shut.
Public/Granted literature
- US20160369421A1 ANODE HOLDER AND PLATING APPARATUS Public/Granted day:2016-12-22
Information query