Invention Grant
- Patent Title: Reflective mask blank and process for producing the reflective mask blank
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Application No.: US15424176Application Date: 2017-02-03
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Publication No.: US10241390B2Publication Date: 2019-03-26
- Inventor: Hiroshi Hanekawa
- Applicant: AGC Inc.
- Applicant Address: JP Chiyoda-ku
- Assignee: AGC Inc.
- Current Assignee: AGC Inc.
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-033603 20160224
- Main IPC: G03F1/24
- IPC: G03F1/24 ; H01L21/033
Abstract:
To provide a reflective mask blank having pseudo defects significantly excluded. The reflective mask blank comprises a substrate, a reflective layer for reflecting EUV light, formed on the substrate, and an absorber layer for absorbing EUV light, formed on the reflective layer, wherein Ssk
Public/Granted literature
- US20170242330A1 REFLECTIVE MASK BLANK AND PROCESS FOR PRODUCING THE REFLECTIVE MASK BLANK Public/Granted day:2017-08-24
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