At least one lithography apparatus that suppresses a decrease in the accuracy of stage control is provided. A lithography apparatus includes a moving unit configured to move with an original or a substrate mounted thereon, a plurality of measurement units configured to obtain information about a position of the moving unit, measurement areas of the respective measurement units overlapping each other, and a control unit configured to switch the measurement units used to obtain the information about the position of the moving unit, based on a switching position lying in an overlapping measurement area, wherein, in a case where a plurality of processes is performed on one of a plurality of processing targets on the original or on the substrate, the control unit makes the switching position changeable and controls the measurement units so that the same one of the measurement units is used in performing the plurality of processes.