Invention Grant
- Patent Title: Safe and low temperature thermite reaction systems and method to form porous silicon
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Application No.: US15436027Application Date: 2017-02-17
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Publication No.: US10246337B2Publication Date: 2019-04-02
- Inventor: Xiaolin Li , Ji-Guang Zhang , Jun Liu
- Applicant: Battelle Memorial Institute
- Applicant Address: US WA Richland
- Assignee: Battelle Memorial Institute
- Current Assignee: Battelle Memorial Institute
- Current Assignee Address: US WA Richland
- Agency: Klarquist Sparkman, LLP
- Main IPC: C01B33/023
- IPC: C01B33/023

Abstract:
Embodiments of a safe, low-temperature reaction system and method for preparing porous silicon are disclosed. The porous silicon is prepared from porous silica, a low-melting metal halide, and a metal comprising aluminum, magnesium, or a combination thereof. Advantageously, embodiments of the disclosed methods can be performed at temperatures ≤400° C. Silicon produced by the disclosed methods has a porosity that is equal to or greater than the porous silica precursor. The porous silicon is suitable for use in electrodes.
Public/Granted literature
- US20180237305A1 SAFE AND LOW TEMPERATURE THERMITE REACTION SYSTEMS AND METHOD TO FORM POROUS SILICON Public/Granted day:2018-08-23
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