Invention Grant
- Patent Title: Light-resistance improver
-
Application No.: US14779226Application Date: 2013-10-17
-
Publication No.: US10246586B2Publication Date: 2019-04-02
- Inventor: Tatsuki Akashi , Mitsuteru Mutsuda
- Applicant: DAICEL-EVONIK LTD.
- Applicant Address: JP Tokyo
- Assignee: DAICEL-EVONIK LTD.
- Current Assignee: DAICEL-EVONIK LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2013-086720 20130417
- International Application: PCT/JP2013/078189 WO 20131017
- International Announcement: WO2014/171028 WO 20141023
- Main IPC: C08L27/18
- IPC: C08L27/18 ; C08L71/00

Abstract:
Provided is an additive that increases or improves a light resistance of anon-fluorinated thermoplastic resin (e.g., a super engineering plastic, such as an aromatic polyamide, a liquid crystal polyester, or an aromatic polyetherketone resin). The additive comprises a fluorine-containing resin. The fluorine-containing resin may be, for example, a fluorine-containing resin comprising a tetrafluoroethylene unit as a monomer unit, in particular, may be a tetrafluoroethylene copolymer (e.g., at least one member selected from the group consisting of a copolymer of tetrafluoroethylene and another fluorinated olefin, a copolymer of tetrafluoroethylene and a fluorinated vinyl ether, and a copolymer of tetrafluoroethylene, another fluorinated olefin and a fluorinated vinyl ether).
Public/Granted literature
- US20160046806A1 LIGHT-RESISTANCE IMPROVER Public/Granted day:2016-02-18
Information query