Invention Grant
- Patent Title: Retention material for gas processing device
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Application No.: US14777983Application Date: 2014-03-24
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Publication No.: US10247077B2Publication Date: 2019-04-02
- Inventor: Hiroki Nakamura , Nobuya Tomosue , Tadashi Sakane
- Applicant: NICHIAS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NICHIAS CORPORATION
- Current Assignee: NICHIAS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Griffin and Szipl PC
- Priority: JP2013-066240 20130327; JP2013-255067 20131210
- International Application: PCT/JP2014/001672 WO 20140324
- International Announcement: WO2014/156104 WO 20141002
- Main IPC: F01N3/28
- IPC: F01N3/28 ; F01N3/021 ; F01N13/16

Abstract:
A retention material for a gas processing device including a processing structure and a casing for accommodating the processing structure, the retention material including inorganic fibers and being arranged between the processing structure and the casing, wherein in a test of repeating a cycle of compressing the retention material until a bulk density of the retention material becomes a prescribed compression bulk density, followed by retaining for 10 seconds, and then releasing until a bulk density of the retention material becomes a release bulk density that is smaller by 12% of said prescribed compression bulk density; a release surface pressure of the retention material after repeating the cycle 2500 times and the compression bulk density of the retention material satisfies the relationship, P≥17.10×D−1.62 wherein P is the release surface pressure (N/cm2) and D is the compression bulk density (g/cm3).
Public/Granted literature
- US20160115846A1 RETENTION MATERIAL FOR GAS PROCESSING DEVICE Public/Granted day:2016-04-28
Information query
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