Invention Grant
- Patent Title: Optical alignment method and patterned retarder manufacturing method using polarized pulse UV
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Application No.: US14888924Application Date: 2013-11-25
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Publication No.: US10247868B2Publication Date: 2019-04-02
- Inventor: Gyo Jic Shin , Sang Kug Lee , Kyung Ho Choi
- Applicant: Korea Institute of Industrial Technology
- Applicant Address: KR Cheonan-si, Chungcheongnam-do
- Assignee: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
- Current Assignee: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
- Current Assignee Address: KR Cheonan-si, Chungcheongnam-do
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2013-0077384 20130702; KR10-2013-0077385 20130702
- International Application: PCT/KR2013/010740 WO 20131125
- International Announcement: WO2015/002353 WO 20150108
- Main IPC: G02B5/30
- IPC: G02B5/30 ; B29D11/00 ; G02F1/1337 ; G02B27/26 ; G02F1/13363
Abstract:
The present invention relates to a method for manufacturing a patterned retarder including an optical alignment layer or a first domain optically aligned in a first direction and a second domain optically aligned in a second direction. According to the invention, it is possible to improve productivity and to maximize optical alignment efficiency by reducing an optical alignment processing time using polarized pulse UV.
Public/Granted literature
- US20160085010A1 OPTICAL ALIGNMENT METHOD AND PATTERNED RETARDER MANUFACTURING METHOD USING POLARIZED PULSE UV Public/Granted day:2016-03-24
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