Invention Grant
- Patent Title: Fabrication of compound semiconductor structures
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Application No.: US15166825Application Date: 2016-05-27
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Publication No.: US10249492B2Publication Date: 2019-04-02
- Inventor: Daniele Caimi , Lukas Czornomaz , Jean Fompeyrine , Emanuele Uccelli
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Otterstedt, Ellenbogen & Kammer, LLP
- Agent Daniel P. Morris
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/78 ; H01L29/32 ; H01L29/20 ; H01L29/66

Abstract:
A semiconductor substrate, comprising a first semiconductor material, is provided and an insulating layer is formed thereon; an opening is formed in the insulating layer. Thereby, a seed surface of the substrate is exposed. The opening has sidewalls and a bottom and the bottom corresponds to the seed surface of the substrate. A cavity structure is formed above the insulating layer, including the opening and a lateral growth channel extending laterally over the substrate. A matching array is grown on the seed surface of the substrate, including at least a first semiconductor matching structure comprising a second semiconductor material and a second semiconductor matching structure comprising a third semiconductor material. The compound semiconductor structure comprising a fourth semiconductor material is grown on a seed surface of the second matching structure. The first through fourth semiconductor materials are different from each other. Corresponding semiconductor structures are also included.
Public/Granted literature
- US20170345654A1 FABRICATION OF COMPOUND SEMICONDUCTOR STRUCTURES Public/Granted day:2017-11-30
Information query
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