Invention Grant
- Patent Title: Light emitting diode and fabrication method thereof
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Application No.: US15852696Application Date: 2017-12-22
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Publication No.: US10249773B2Publication Date: 2019-04-02
- Inventor: Yuehua Jia , Chun-Yi Wu , Ching-Shan Tao
- Applicant: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Xiamen
- Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Xiamen
- Agency: Syncoda LLC
- Agent Feng Ma
- Priority: CN201510790905 20151117
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/18 ; H01L31/0224 ; H01L33/38 ; H01L33/40

Abstract:
A light-emitting diode chip includes a first semiconductor layer, a second semiconductor layer and an active layer between them; an dielectric layer having a conductive through-hole array over the lower surface of the light-emitting epitaxial laminated layer; a metal conductive layer over the lower surface of the dielectric layer, which fills up the conductive through-hole, and forms ohmic contact with the light-emitting epitaxial laminated layer; a conductive substrate over the lower surface of the metal conductive layer for supporting the light-emitting epitaxial laminated layer; a first electrode comprising a bonding pad electrode and a finger-shape electrode over the upper surface of the light-emitting epitaxial laminated layer, wherein, a rotation angle is formed between the conductive through-hole array and the finger-shape electrode, which is selected to prevent a preferred number of conductive through-holes from being shielded by the bonding pad electrode and the finger-shape electrode.
Public/Granted literature
- US20180122992A1 Light Emitting Diode and Fabrication Method Thereof Public/Granted day:2018-05-03
Information query
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