Invention Grant
- Patent Title: Fine particle production apparatus and fine particle production method
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Application No.: US15251840Application Date: 2016-08-30
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Publication No.: US10252339B2Publication Date: 2019-04-09
- Inventor: Hisao Nagai , Takeshi Koiwasaki , Daisuke Suetsugu , Takafumi Okuma
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Panasonic IP Management
- Agent Kerry S. Culpepper
- Priority: JP2015-221911 20151112
- Main IPC: B22F9/16
- IPC: B22F9/16 ; B01J19/08 ; C01B21/068 ; C01B33/021 ; C01B33/18 ; C01F7/02 ; B22F9/14 ; C01B32/956

Abstract:
To provide an apparatus and a method of producing fine particles capable of increasing evaporation efficiency of a material, increasing the production of fine particles and reducing costs by heating the inputted material by a gas heated by thermal plasma. A fine particle production apparatus includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles from a material feeding port into the vacuum chamber, electrodes arranged in the vacuum chamber for generating plasma and a collection device connected to the vacuum chamber and collecting fine particles, which produces the fine particles from the material by generating electric discharge inside the vacuum chamber, in which the collection device and the material feeding device are connected by piping, and a material heating and circulation device which heats the material by heat of a gas inside the chamber heated by the plasma through the piping is provided.
Public/Granted literature
- US20170136546A1 FINE PARTICLE PRODUCTION APPARATUS AND FINE PARTICLE PRODUCTION METHOD Public/Granted day:2017-05-18
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