Invention Grant
- Patent Title: Method and apparatus for forward deposition of material onto a substrate using burst ultrafast laser pulse energy
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Application No.: US14542647Application Date: 2014-11-16
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Publication No.: US10252507B2Publication Date: 2019-04-09
- Inventor: S. Abbas Hosseini
- Applicant: ROFIN-SINAR TECHNOLOGIES INC.
- Applicant Address: US MI Plymouth
- Assignee: ROFIN-SINAR TECHNOLOGIES LLC
- Current Assignee: ROFIN-SINAR TECHNOLOGIES LLC
- Current Assignee Address: US MI Plymouth
- Agency: Woodling, Krost and Rust
- Main IPC: B32B38/00
- IPC: B32B38/00 ; C23C14/28

Abstract:
A process of forward deposition of a material onto a target substrate is accomplished by passing a burst of ultrafast laser pulses of a laser beam through a carrier substrate that is transparent to a laser beam. The carrier substrate is coated with a material to be transferred on the bottom side thereof. Electrons on the back side of said transparent carrier coated with the material are excited by the first few sub-pulses of the laser beam which lifts the material from the carrier substrate and subsequent sub-pulse of the laser beam send the material into space at hypersonic speed by a shock wave that drives the material with forward momentum across a narrow gap between the carrier substrate and the target substrate, and onto the target substrate.
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