Invention Grant
- Patent Title: Nano-structure of block copolymer and method of manufacturing the same
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Application No.: US13627782Application Date: 2012-09-26
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Publication No.: US10253187B2Publication Date: 2019-04-09
- Inventor: Mi-Jeong Kim , Yeon-Sik Jung , Woon-Ik Park , Jae-Won Jeong
- Applicant: Mi-Jeong Kim , Yeon-Sik Jung , Woon-Ik Park , Jae-Won Jeong
- Applicant Address: KR Gyeonggi-Do KR Daejeon
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Gyeonggi-Do KR Daejeon
- Agency: Cantor Colburn LLP
- Priority: KR10-2011-0116111 20111108
- Main IPC: C09D5/00
- IPC: C09D5/00 ; C09D153/00 ; H01L21/033 ; B81C1/00 ; G03F7/00 ; B82Y40/00
Abstract:
A nano-structured block copolymer that includes a self-assembled block copolymer disposed on a substrate, wherein the block copolymer includes a plurality of block structural units, and at least two block structural units have a solubility parameter difference of greater than or equal to about 5 megaPascal1/2.
Public/Granted literature
- US20130224442A1 NANO-STRUCTURE OF BLOCK COPOLYMER AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2013-08-29
Information query
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