Invention Grant
- Patent Title: Silicon carbide single crystal and method for producing silicon carbide single crystal
-
Application No.: US14764243Application Date: 2014-01-13
-
Publication No.: US10253431B2Publication Date: 2019-04-09
- Inventor: Hiroyuki Kondo , Shoichi Onda , Yasuo Kitou , Hiroki Watanabe
- Applicant: DENSO CORPORATION
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: POSZ LAW GROUP, PLC
- Priority: JP2013-31239 20130220
- International Application: PCT/JP2014/000100 WO 20140113
- International Announcement: WO2014/129103 WO 20140828
- Main IPC: C30B29/36
- IPC: C30B29/36 ; C30B23/00 ; C30B23/02 ; C01B32/956

Abstract:
A silicon carbide single crystal includes a spiral dislocation. The spiral dislocation includes a L dislocation having a burgers vector defined as b, which satisfies an equation of b> +1/3 . The L dislocation has a density equal to or lower than 300 dislocations/cm2, preferably, 100 dislocations/cm2, since the L dislocation has large distortion and causes generation of leakage current. Thus, the silicon carbide single crystal with high quality is suitable for a device production which can suppress the leakage current.
Public/Granted literature
- US20150361586A1 SILICON CARBIDE SINGLE CRYSTAL AND METHOD FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL Public/Granted day:2015-12-17
Information query
IPC分类: