Invention Grant
- Patent Title: Electromagnetic radiation-scattering element and method of manufacturing same
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Application No.: US14770174Application Date: 2014-02-24
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Publication No.: US10254449B2Publication Date: 2019-04-09
- Inventor: Hans-Christoph Eckstein , Uwe Zeitner
- Applicant: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung E.V.
- Applicant Address: DE Munich
- Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
- Current Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
- Current Assignee Address: DE Munich
- Agency: Jacobson Holman, PLLC.
- Priority: DE102013003441 20130225
- International Application: PCT/EP2014/053543 WO 20140224
- International Announcement: WO2014/128298 WO 20140828
- Main IPC: G02B5/02
- IPC: G02B5/02 ; G02B5/18 ; G01B11/24 ; G02B27/00

Abstract:
The invention relates to an electromagnetic optical element which scatters radiation in a diffuse manner. Such optical elements can be used in nearly all projection applications including front and rear projection, display applications, (cinema) screens and similar. On the surface of a claimed optical element, a surface profile is provided, the surface structure of which is non-repeating and irregular. Elevations are formed that have a height by means of which a phase shift Δϕ may be achieved that is greater than two and a half times the longest wavelength used, and the elevations have a lateral extension in one plane respectively, in all axial directions, that is greater than five times the longest wavelength used. The individual elevations have a continuous form in the three spatial axial directions and said elevations are devoid of edges, ledges and fissures.
Public/Granted literature
- US20160047951A1 ELECTROMAGNETIC RADIATION-SCATTERING ELEMENT AND METHOD OF MANUFACTURING SAME Public/Granted day:2016-02-18
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