The present invention provides an imprint apparatus which forms a pattern on an imprint material on a shot region on a substrate by using a mold, the apparatus comprising a supply unit having a plurality of discharge outlets each of which is configured to discharge the imprint material, and configured to supply the imprint material to the substrate, and a control unit configured to control the supply unit so as to supply the imprint material from the plurality of discharge outlets onto the shot region, wherein the control unit determines discharge outlets to be used to supply the imprint material to the shot region among the plurality of discharge outlets based on discharge history information indicating a history of discharge of the imprint material from each of the plurality of discharge outlets.