Invention Grant
- Patent Title: Metrology methods, metrology apparatus and device manufacturing method
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Application No.: US15614551Application Date: 2017-06-05
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Publication No.: US10254644B2Publication Date: 2019-04-09
- Inventor: Richard Quintanilha , Nitish Kumar
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP16173755 20160609
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/00 ; G03F7/20 ; G01N21/956 ; G03F9/00

Abstract:
A metrology apparatus uses radiation (304) in an EUV waveband. A first detection system (333) includes a spectroscopic grating (312) and a detector (313) for capturing a spectrum of the EUV radiation after interaction with a target (T). Properties of the target are measured by analyzing the spectrum. The radiation (304) further includes radiation in other wavebands such as VUV, DUV, UV, visible and IR. A second detection system (352, 372, 382) is arranged to receive at least a portion of radiation (350) reflected by the first spectroscopic grating and to capture a spectrum (SA) in one or more of said other wavebands. The second waveband spectrum can be used to enhance accuracy of the measurement based on the EUV spectrum, and/or it can be used for a different measurement. Other types of detection, such as polarization can be used instead or in addition to spectroscopic gratings.
Public/Granted literature
- US20170357155A1 Metrology Methods, Metrology Apparatus and Device Manufacturing Method Public/Granted day:2017-12-14
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