Invention Grant
- Patent Title: Method for producing optical waveguide
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Application No.: US15030894Application Date: 2014-10-16
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Publication No.: US10254649B2Publication Date: 2019-04-09
- Inventor: Osamu Mikami , Kentaro Ohmori , Hideyuki Nawata
- Applicant: TOKAI UNIVERSITY EDUCATIONAL SYSTEM , NISSAN CHEMICAL INDUSTRIES, LTD.
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: TOKAI UNIVERSITY EDUCATIONAL SYSTEM,NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee: TOKAI UNIVERSITY EDUCATIONAL SYSTEM,NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Oliff PLC
- Priority: JP2013-218530 20131021
- International Application: PCT/JP2014/077551 WO 20141016
- International Announcement: WO2015/060190 WO 20150430
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/09 ; G03F7/16 ; G03F7/20 ; G03F7/30 ; G02B6/138 ; G02B6/122 ; G02B6/26 ; C08F290/14 ; C08G77/16 ; C09D183/04 ; C08G77/20 ; C08G77/00 ; G02B1/111 ; B29D11/00 ; G03F7/00 ; G03F7/32

Abstract:
A method for producing an optical waveguide composing an optical path conversion component having an extremely low signal loss, allowing a high surface packaging density and high speed operation, and allowing high productivity. A method for producing an optical waveguide that propagates light from a surface of a support to an oblique direction not vertical to the surface, the method for producing an optical waveguide comprising the steps of: (1) providing an anti-reflective coating on the support; (2) placing a photosensitive resin composition on the anti-reflective coating, and exposing the photosensitive resin composition to a light ray entering from a direction non-vertical to the surface of the support through a photomask for curing the composition; and (3) removing the unexposed photosensitive resin composition by development; and an optical waveguide obtained by the method.
Public/Granted literature
- US20160252816A1 METHOD FOR PRODUCING OPTICAL WAVEGUIDE Public/Granted day:2016-09-01
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