Invention Grant
- Patent Title: Substrate processing apparatus, editing apparatus and method and non-transitory storage medium
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Application No.: US14609901Application Date: 2015-01-30
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Publication No.: US10254816B2Publication Date: 2019-04-09
- Inventor: Seiichiro Yuasa , Kunihiko Fujimoto
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Minato-Ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-Ku
- Agency: Burr & Brown, PLLC
- Priority: JP2014-017713 20140131
- Main IPC: G06F1/32
- IPC: G06F1/32 ; G06F1/3234 ; G06F1/3287 ; G05B19/042 ; H01L21/67

Abstract:
A control unit of a substrate processing apparatus has a storage medium that stores operation commands as a single macro. The operation commands include an operation command for shutdown of the substrate processing apparatus by which the substrate processing apparatus is automatically transferred from a normally-operating condition to a condition suitable for man power maintenance, and an operation command for startup of the substrate processing apparatus by which the substrate processing apparatus is automatically transferred to a condition suitable for normal operation after completion of the man power maintenance. The control unit makes a display unit display both the operation commands for shutdown and startup together on a single ejection screen of the display unit, and allows editing of the macro on the single edit screen by using the input unit.
Public/Granted literature
- US20150220136A1 SUBSTRATE PROCESSING APPARATUS, EDITING APPARATUS AND METHOD AND NON-TRANSITORY STORAGE MEDIUM Public/Granted day:2015-08-06
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