Invention Grant
- Patent Title: Raw material gas supply apparatus, raw material gas supply method and storage medium
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Application No.: US15280634Application Date: 2016-09-29
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Publication No.: US10256101B2Publication Date: 2019-04-09
- Inventor: Hironori Yagi , Kensaku Narushima , Atsunari Matsuyama
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Priority: JP2015-194887 20150930; JP2015-241520 20151210
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/285 ; C23C16/455 ; C23C16/52 ; H01L21/02 ; C23C16/14 ; C23C16/448

Abstract:
In a raw material gas supply apparatus, a control unit obtains an offset value of (m3−(m1+m2)), m1, m2 and m3 being respective measurement values of first and second mass controllers, and a mass flow meter, by supplying a carrier gas and a dilution gas in a state where the carrier gas flows through a bypass channel. Further, the control unit obtains an actual measurement value of a flow rate of the raw material by subtracting the offset value from (m3−(m1+m2)) obtained by supplying the carrier gas and dilution gas in a state where the carrier gas flows through the inside of a raw material container and calculating a difference between a target value of the flow rate of the raw material and the actual measurement value, and adjusts a set value of the first mass flow controller such that the flow rate of the raw material becomes.
Public/Granted literature
- US20170092549A1 RAW MATERIAL GAS SUPPLY APPARATUS, RAW MATERIAL GAS SUPPLY METHOD AND STORAGE MEDIUM Public/Granted day:2017-03-30
Information query
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