Invention Grant
- Patent Title: Dicing method
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Application No.: US15118836Application Date: 2015-02-09
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Publication No.: US10256147B2Publication Date: 2019-04-09
- Inventor: Martin Schrems , Bernhard Stering , Franz Schrank
- Applicant: ams AG
- Applicant Address: AT Unterpremstaetten
- Assignee: ams AG
- Current Assignee: ams AG
- Current Assignee Address: AT Unterpremstaetten
- Agency: Fish & Richardson P.C.
- Priority: EP14155240 20140214
- International Application: PCT/EP2015/052645 WO 20150209
- International Announcement: WO2015/121198 WO 20150820
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L23/00 ; H01L21/683 ; H01L21/768

Abstract:
The dicing method comprises the steps of providing a substrate (1) of semiconductor material, the substrate having a main surface (10), where integrated components (3) of chips (13) are arranged, and a rear surface (11) opposite the main surface, fastening a first handling wafer above the main surface, thinning the substrate at the rear surface, and forming trenches (20) penetrating the substrate and separating the chips by a single etching step after the substrate has been thinned.
Public/Granted literature
- US20170062277A1 DICING METHOD Public/Granted day:2017-03-02
Information query
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