Invention Grant
- Patent Title: Package structure and manufacturing method thereof
-
Application No.: US15424898Application Date: 2017-02-06
-
Publication No.: US10256179B2Publication Date: 2019-04-09
- Inventor: Po-Chun Lin
- Applicant: NANYA TECHNOLOGY CORPORATION
- Applicant Address: TW Taoyuan
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW Taoyuan
- Agency: CKC & Partners Co., LLC
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/00 ; H01L21/56 ; H01L23/31

Abstract:
A package structure includes an interconnection layer; a passivation layer disposed on the interconnection layer, in which the interconnection layer and the passivation layer defined at least one opening; at least one elastic bump disposed on the interconnection layer, in which a portion of the elastic bump is embedded in the opening; and a conductive layer disposed on the elastic bump.
Public/Granted literature
- US20180226332A1 PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-08-09
Information query
IPC分类: