Invention Grant
- Patent Title: Reforming device and method for manufacturing chemical products
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Application No.: US15377596Application Date: 2016-12-13
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Publication No.: US10258960B2Publication Date: 2019-04-16
- Inventor: Mikiya Sakurai , Naoya Okuzumi , Ryota Shimura , Shuichi Miyamoto , Yoshio Seiki , Hiroyuki Osora
- Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
- Applicant Address: JP Kanagawa
- Assignee: MITSUBISHI HEAVY INDUSTRIES ENGINEERING, LTD.
- Current Assignee: MITSUBISHI HEAVY INDUSTRIES ENGINEERING, LTD.
- Current Assignee Address: JP Kanagawa
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: WOPCT/JP2012/073374 20120912
- Main IPC: C01B3/34
- IPC: C01B3/34 ; C07C29/151 ; C07C273/10 ; C07C1/02 ; B01J19/24 ; C01B32/50 ; C01B32/40 ; C01B3/38 ; B01D53/48 ; C01B3/32 ; C01C1/04 ; C01C1/02

Abstract:
A reforming device (10) according to the present invention has a compressor (11), a first heat exchanger (12), a desulfurization device (13), a reformer (14), a raw material gas branching line (L11) that extracts a compressed natural gas (21) from a downstream side of the desulfurization device (13) with respect to the flow direction of the natural gas (21) and supplies the natural gas (21) to the reformer (14), and a flue gas discharging line (L12) that discharges a flue gas (22) generated in the reformer (14), wherein the first heat exchanger (12) is provided in the flue gas discharging line (L12), and the flue gas (22) is used as a heating medium of the compressed natural gas (21).
Public/Granted literature
- US20170096333A1 REFORMING DEVICE AND METHOD FOR MANUFACTURING CHEMICAL PRODUCTS Public/Granted day:2017-04-06
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