Invention Grant
- Patent Title: Structure, production method thereof, and article provided with said structure
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Application No.: US15021745Application Date: 2014-09-18
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Publication No.: US10259149B2Publication Date: 2019-04-16
- Inventor: Seiichiro Mori , Kousuke Fujiyama , Go Otani , Yusuke Nakai , Tetsuya Jigami
- Applicant: Mitsubishi Rayon Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Chemical Corporation
- Current Assignee: Mitsubishi Chemical Corporation
- Current Assignee Address: JP Tokyo
- Agency: Morgan, Lewis & Bockius LLP
- Priority: JP2013-193215 20130918
- International Application: PCT/JP2014/074662 WO 20140918
- International Announcement: WO2015/041283 WO 20150326
- Main IPC: B29C35/08
- IPC: B29C35/08 ; G02B1/11 ; G02B1/118 ; B32B3/30 ; B32B27/30 ; B32B27/06 ; B29C59/04 ; B29C43/22 ; B29C43/46 ; B29L11/00 ; B29L7/00 ; B29K105/00 ; B29C43/58 ; B22C9/06 ; C25D11/12 ; C25D11/16 ; G01N3/56

Abstract:
A structure with a substrate, and a fine-unevenness-structure layer provided to at least one surface of the substrate, wherein the fine-unevenness-structure layer is disposed at a surface of the structure, the indentation elastic modulus of the structure is 1-1300 MPa, and the ratio (Δμ) of the rate of change of the coefficient of kinetic friction of the surface of the structure is 0.15-1.05, wherein Δμ=Δμf/Δμs: Δμs represents the rate of change of the coefficient of kinetic friction of the surface of the structure at an initial-abrasion stage of a reciprocating abrasion test; and Δμf represents the rate of change of the coefficient of kinetic friction of the surface of the structure immediately prior to the end of the reciprocating abrasion test. This structure exhibits excellent scratch resistance without compromising on the optical performance thereof, such as the antireflection performance.
Public/Granted literature
- US20160229095A1 STRUCTURE, PRODUCTION METHOD THEREOF, AND ARTICLE PROVIDED WITH SAID STRUCTURE Public/Granted day:2016-08-11
Information query
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