- Patent Title: Method for producing silicon carbide single crystal in a solution process using a seed crystal having a bottom face with a circular shape and at least a partially removed section
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Application No.: US15714304Application Date: 2017-09-25
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Publication No.: US10260167B2Publication Date: 2019-04-16
- Inventor: Katsunori Danno
- Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Applicant Address: JP Toyota
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Toyota
- Agency: Oliff PLC
- Priority: JP2016-199126 20161007
- Main IPC: C30B9/04
- IPC: C30B9/04 ; C30B29/36 ; C30B9/06 ; C30B19/04 ; C30B19/10 ; C30B29/40

Abstract:
A method for producing a SiC single crystal with few dislocations and defects and a large diameter enlargement ratio is provided. A method for producing a SiC single crystal by solution process, wherein a bottom face of a seed crystal is (0001) or (000-1) face and has circular shape with at least a partially removed section and a circular arc-shaped section on an outer periphery, the number of the removed sections is one or more, shapes of the removed sections are bow-shaped with a minor arc or semi-circumference removed along a chord connecting two points on the circular arc, a central angle formed by a center of the circular shape and the two points is 40° or greater, and a total of the central angles of the removed sections is no greater than 180°, the method comprising forming a meniscus and growing the single crystal from the bottom face.
Public/Granted literature
- US20180100247A1 METHOD FOR PRODUCING SIC SINGLE CRYSTAL Public/Granted day:2018-04-12
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