Invention Grant
- Patent Title: LTPS multilayered structure and method for measuring misalignment in the same structure
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Application No.: US14682740Application Date: 2015-04-09
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Publication No.: US10260872B2Publication Date: 2019-04-16
- Inventor: Ching Che Yang , Yu Chia Huang , Wei-Liang Wu
- Applicant: EverDisplay Optronics (Shanghai) Limited
- Applicant Address: CN Shanghai
- Assignee: EverDisplay Optronics (Shanghai) Limited
- Current Assignee: EverDisplay Optronics (Shanghai) Limited
- Current Assignee Address: CN Shanghai
- Agent Yunling Ren
- Priority: CN201410143349 20140410
- Main IPC: H01L23/544
- IPC: H01L23/544 ; G01B21/16 ; G03F7/20 ; H01L21/66

Abstract:
The present application provides an LTPS multilayered structure, which includes: a first stack layer having a reference pattern structure formed thereon and provided with uniformly distributed first references; and a second stack layer disposed on the first stack layer and having an alignment pattern structure formed thereon and provided with uniformly distributed second references each selectively aligning with one of the first references so that misalignment between the first stack layer and the second stack layer is precisely calculated by markings attached to each of the first references. The present further provides a method for measuring misalignment between a plurality of stack layers in the LTPS multilayered structure.
Public/Granted literature
- US20150294941A1 LTPS MULTILAYERED STRUCTURE AND METHOD FOR MEASURING MISALIGNMENT IN THE SAME STRUCTURE Public/Granted day:2015-10-15
Information query
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