- Patent Title: Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic device
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Application No.: US15291538Application Date: 2016-10-12
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Publication No.: US10261417B2Publication Date: 2019-04-16
- Inventor: Akiyoshi Goto , Michihiro Shirakawa , Keita Kato , Fumihiro Yoshino , Kei Yamamoto
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-083076 20140414
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; C07C309/06 ; C07C381/12 ; G03F7/16 ; H01L21/027 ; G03F7/20 ; G03F7/32 ; G03F7/38 ; G03F7/40
Abstract:
An active-light-sensitive or radiation-sensitive resin composition includes a resin (A) and a photoacid generator (B) capable of generating an acid upon irradiation with active light or radiation, in which the active-light-sensitive or radiation-sensitive resin composition contains at least a photoacid generator (B1) represented by the following General Formula (1) and a photoacid generator (B2) other than the photoacid generator (B1) as the photoacid generator (B).
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