Invention Grant
- Patent Title: Coating compositions for use with an overcoated photoresist
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Application No.: US15250302Application Date: 2016-08-29
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Publication No.: US10261418B2Publication Date: 2019-04-16
- Inventor: Anthony Zampini , Gerald B. Wayton
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/09
- IPC: G03F7/09 ; G03F7/20 ; C08L33/06 ; C08L35/00 ; C08L67/00 ; C09D133/06 ; C09D133/12 ; C09D135/00 ; C09D145/00 ; C09D167/02 ; H01L21/027

Abstract:
Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.
Public/Granted literature
- US20160363862A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST Public/Granted day:2016-12-15
Information query
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