Invention Grant
- Patent Title: Magnetoresistance effect element
-
Application No.: US15713029Application Date: 2017-09-22
-
Publication No.: US10263182B2Publication Date: 2019-04-16
- Inventor: Tomoyuki Sasaki
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2016-192007 20160929
- Main IPC: H01L43/10
- IPC: H01L43/10 ; H01L43/08 ; H01L43/02 ; H01L43/06

Abstract:
A magnetoresistance effect element is capable of realizing a high magnetoresistance (MR) ratio. The magnetoresistance effect element includes a laminate in which: an underlayer; a first ferromagnetic metal layer; a tunnel barrier layer; and a second ferromagnetic metal layer are laminated in that order. The underlayer is made of a nitride, the tunnel barrier layer is made of any one selected from a group consisting of MgAl2O4, ZnAl2O4, MgO, and γ-Al2O3, and a degree of lattice mismatching between a lattice constant of the tunnel barrier layer and a lattice constant of a crystal structure to be taken by the underlayer is 5% or less.
Public/Granted literature
- US20180090677A1 MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2018-03-29
Information query
IPC分类: