Invention Grant
- Patent Title: Atomizing device
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Application No.: US15489021Application Date: 2017-04-17
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Publication No.: US10265718B2Publication Date: 2019-04-23
- Inventor: Chun-Tai Chiang
- Applicant: Taiwan Puritic Corp.
- Applicant Address: TW Hsinchu County
- Assignee: TAIWAN PURITIC CORP.
- Current Assignee: TAIWAN PURITIC CORP.
- Current Assignee Address: TW Hsinchu County
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW105123807A 20160727
- Main IPC: F24F6/14
- IPC: F24F6/14 ; B05B17/06

Abstract:
An atomizing device includes a first liquid chamber to store a liquid to be atomized; a nozzle plate unit disposed on the first liquid chamber and used to spray the liquid into first atomized droplets; and an indirect spray unit disposed at a position where the first atomized droplets are sprayed to accept the first atomized droplets. The indirect spray unit includes a channel structure having a droplet inlet disposed toward a position where the nozzle plate unit sprays out the first atomized droplets; and a droplet outlet disposed on one side wall of the atomizing device. The droplet inlet receives the first atomized droplets to enter the indirect spray unit. The first atomizing droplets undertake striking and rebounding repeatedly in the channel structure to form the second atomized droplets. The second atomized droplets are sprayed out from the droplet outlet.
Public/Granted literature
- US20180029065A1 ATOMIZING DEVICE Public/Granted day:2018-02-01
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