Invention Grant
- Patent Title: Method for manufacturing liquid ejection head
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Application No.: US15955576Application Date: 2018-04-17
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Publication No.: US10265960B2Publication Date: 2019-04-23
- Inventor: Isamu Horiuchi
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2017-086450 20170425
- Main IPC: H01L21/00
- IPC: H01L21/00 ; B41J2/16

Abstract:
A method for manufacturing a liquid ejection head includes forming a first negative photosensitive resin layer containing a photopolymerizable compound and a photopolymerization initiator over a substrate, exposing the first negative photosensitive resin layer to light to form a latent image of a flow channel member, forming a second negative photosensitive resin layer containing a photopolymerizable compound and a photopolymerization initiator over the first negative photosensitive resin layer having the latent image, and exposing the second negative photosensitive resin layer to light to form a latent image of an ejection opening member. The first negative photosensitive resin layer has a thickness of 10 μm or less and further contains a sensitivity adjusting agent capable of reducing the sensitivity of the first negative photosensitive resin layer. The transmittance A of the first negative photosensitive resin layer is 0.70 or less for the exposure light for the second negative photosensitive resin layer.
Public/Granted literature
- US20180304632A1 METHOD FOR MANUFACTURING LIQUID EJECTION HEAD Public/Granted day:2018-10-25
Information query
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