Invention Grant
- Patent Title: MEMS device with enhanced sensing structure and manufacturing method thereof
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Application No.: US15605329Application Date: 2017-05-25
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Publication No.: US10266396B2Publication Date: 2019-04-23
- Inventor: Ching-Kai Shen , Wen-Chuan Tai , Chia-Ming Hung , Hsiang-Fu Chen , Jung-Huei Peng , Chun-Wen Cheng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: B81B7/02
- IPC: B81B7/02 ; B81B7/00 ; H01L21/44 ; H01L21/48 ; H01L21/50

Abstract:
The present disclosure provides a semiconductor device, which includes a first substrate comprising an upper surface and a second substrate disposed over the first substrate. The semiconductor device also includes a first electrode disposed in the second substrate and configured to move in a direction substantially parallel to the upper surface in response to a pressure difference, and a second electrode disposed in the second substrate. The second electrode is configured to provide a capacitance in conjunction with the first electrode.
Public/Granted literature
- US20180339899A1 MEMS DEVICE WITH ENHANCED SENSING STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-11-29
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