Invention Grant
- Patent Title: Device for manufacturing SiO2-TiO2 based glass
-
Application No.: US15716084Application Date: 2017-09-26
-
Publication No.: US10266443B2Publication Date: 2019-04-23
- Inventor: Toshio Yoshinari , Tadahiko Saito
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2012-144149 20120627
- Main IPC: C03B19/14
- IPC: C03B19/14 ; C03C3/04 ; C03B23/00 ; C03C3/06 ; C03B32/00 ; C03B23/049 ; C03B11/00
Abstract:
A device for manufacturing SiO2—TiO2 based glass by growing a glass ingot upon a target by a direct method. The device includes the target, comprising a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot.
Public/Granted literature
- US20180016176A1 DEVICE FOR MANUFACTURING SiO2-TiO2 BASED GLASS Public/Granted day:2018-01-18
Information query
