Invention Grant
- Patent Title: Gas mixing device and substrate processing apparatus
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Application No.: US15622545Application Date: 2017-06-14
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Publication No.: US10266945B2Publication Date: 2019-04-23
- Inventor: Jun Yamashita
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2016-121947 20160620
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/30 ; B01F3/02 ; C23C16/44 ; B01F5/00

Abstract:
A gas mixing device includes: a cylindrical portion including an upper surface which is closed; a gas outflow passage formed in a central portion of a bottom surface of the cylindrical portion, and extends downward; a plurality of gas stream guide walls disposed to be spaced apart from each other in a circumferential direction along an edge of an opening formed by the gas outflow passage in the bottom surface, and installed to be rotationally symmetrical to a center of the cylindrical portion, the gas stream guide walls protruding toward the upper surface; and a gas inlet part installed between the gas stream guide walls and an inner peripheral surface of the cylindrical portion, and into which a gas to be mixed flows.
Public/Granted literature
- US20170362704A1 Gas Mixing Device and Substrate Processing Apparatus Public/Granted day:2017-12-21
Information query
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