Invention Grant
- Patent Title: Mask inspection device and method thereof
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Application No.: US15341806Application Date: 2016-11-02
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Publication No.: US10269105B2Publication Date: 2019-04-23
- Inventor: Chih-Chiang Chang
- Applicant: ACEMACH CO., LTD
- Applicant Address: TW New Taipei
- Assignee: Acemach Co., Ltd.
- Current Assignee: Acemach Co., Ltd.
- Current Assignee Address: TW New Taipei
- Agency: Wang Law Firm, Inc.
- Priority: TW104136761A 20151106
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G06T7/00 ; G01B11/14 ; G01N21/956 ; H04N5/225 ; H04N5/232 ; G06T7/33

Abstract:
A mask inspection device and method thereof are provided. In the mask inspection device, an image capturing module is controlled to capture an image of the object to be inspected, and when the captured image does not match a predetermined correction image, a horizontal position of the bearing module which holds the object is adjusted; when the captured image matches the predetermined correction image, a light emission element projects a spot light towards the object, and the image capturing module captures an image in a mask region of the object, so as to produce a mask inspection image. The mask inspection information can be obtained from a two-dimensional image of the mask inspection image, and an abnormal image of the mask inspection image is inspected to generate mask abnormal information.
Public/Granted literature
- US20170132778A1 MASK INSPECTION DEVICE AND METHOD THEREOF Public/Granted day:2017-05-11
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