- Patent Title: Field-effect transistor (FET) having gate oxide insulating layer including SI and alkaline earth elements, and display element, image display and system including FET
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Application No.: US15289243Application Date: 2016-10-10
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Publication No.: US10269293B2Publication Date: 2019-04-23
- Inventor: Ryoichi Saotome , Naoyuki Ueda , Yuki Nakamura , Yukiko Abe , Shinji Matsumoto , Yuji Sone , Sadanori Arae , Minehide Kusayanagi
- Applicant: RICOH COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: RICOH COMPANY, LTD.
- Current Assignee: RICOH COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Cooper & Dunham LLP
- Priority: JP2015-209335 20151023; JP2016-155752 20160808
- Main IPC: G09G3/3225
- IPC: G09G3/3225 ; G09G3/34 ; H01L29/786 ; H01L21/8234 ; H01L27/12 ; G09G3/36

Abstract:
A field-effect transistor includes a gate electrode to apply a gate voltage, a source electrode and a drain electrode to take electric current out, a semiconductor layer disposed adjacent to the source electrode and the drain electrode, and a gate insulating layer disposed between the gate electrode and the semiconductor layer, wherein the gate insulating layer includes an oxide including silicon and one or two or more alkaline earth metal elements.
Public/Granted literature
- US20170116916A1 FIELD-EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY, SYSTEM, AND COMPOSITION Public/Granted day:2017-04-27
Information query
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