Invention Grant
- Patent Title: Circuit methodology for highly linear and symmetric resistive processing unit
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Application No.: US15831059Application Date: 2017-12-04
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Publication No.: US10269425B2Publication Date: 2019-04-23
- Inventor: Tayfun Gokmen , Seyoung Kim , Hyung-Min Lee , Wooram Lee , Paul Michael Solomon
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: McGinn IP Law Group, PLLC
- Agent Vazken Alexanian
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C13/00 ; G06N3/02 ; G11C7/10 ; G11C11/54
Abstract:
A processing unit includes a circuit including a current mirror, and a capacitor providing a weight based on a charge level of the capacitor. The capacitor is charged or discharged by the current mirror.
Public/Granted literature
- US20180114572A1 CIRCUIT METHODOLOGY FOR HIGHLY LINEAR AND SYMMETRIC RESISTIVE PROCESSING UNIT Public/Granted day:2018-04-26
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