Invention Grant
- Patent Title: Structure and formation method of light sensing device
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Application No.: US15634148Application Date: 2017-06-27
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Publication No.: US10269844B2Publication Date: 2019-04-23
- Inventor: Yun-Wei Cheng , Yi-Hsing Chu , Yin-Chieh Huang , Chun-Hao Chou , Kuo-Cheng Lee , Hsun-Ying Huang , Hsin-Chi Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
Structures and formation methods of a light sensing device are provided. The light sensing device includes a semiconductor substrate and a light sensing region in the semiconductor substrate. The light sensing device also includes a filter element over the semiconductor substrate and aligned with the light sensing region. The filter element has a first portion and a second portion, and the first portion is between the second portion and the light sensing region. The light sensing device further includes a light shielding element over the semiconductor substrate and beside the first portion of the filter element. In addition, the light sensing device includes a dielectric element over the light shielding element and beside the second portion of the filter element. A top width of the light shielding element is greater than a bottom width of the dielectric element.
Public/Granted literature
- US20180374884A1 STRUCTURE AND FORMATION METHOD OF LIGHT SENSING DEVICE Public/Granted day:2018-12-27
Information query
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