Invention Grant
- Patent Title: Processing apparatus
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Application No.: US15720758Application Date: 2017-09-29
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Publication No.: US10279452B2Publication Date: 2019-05-07
- Inventor: Satoshi Yamanaka
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain, Ltd.
- Priority: JP2016-193734 20160930
- Main IPC: B24B41/06
- IPC: B24B41/06 ; B24B37/27 ; B24B7/22 ; B24B37/34 ; B24B57/02

Abstract:
Disclosed herein is a carrying mechanism that carries a plate-shaped workpiece in which a substrate larger than a wafer in area is stacked on a lower surface of the wafer. The carrying mechanism includes a carrying pad for covering an upper surface of the wafer, holding sections for holding the substrate on outside of the outer periphery of the wafer, and a water supply source for supplying water to the wafer. The carrying mechanism forms a predetermined gap between the lower surface of the carrying pad and the upper surface of the wafer, and carries the plate-shaped workpiece in a condition where the gap is supplied with a predetermined amount of water.
Public/Granted literature
- US20180093361A1 PROCESSING APPARATUS Public/Granted day:2018-04-05
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