Invention Grant
- Patent Title: Imprinting method and imprinting apparatus
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Application No.: US14431592Application Date: 2013-10-03
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Publication No.: US10279538B2Publication Date: 2019-05-07
- Inventor: Hirokazu Oda , Takaharu Nagai , Saburou Harada
- Applicant: DAI NIPPON PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: DAI NIPPON PRINTING CO., LTD.
- Current Assignee: DAI NIPPON PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-221893 20121004
- International Application: PCT/JP2013/076973 WO 20131003
- International Announcement: WO2014/054749 WO 20140410
- Main IPC: B29C59/00
- IPC: B29C59/00 ; G03F7/00 ; B29C59/02

Abstract:
Provided are: an imprinting method which suppresses volatilization of a photocurable resin applied on a transfer-receiving substrate by an inkjet method, satisfactorily maintains the wet-spreading property of the resin at the time of transfer, maintains cleanness of the environment for transfer, and can fill the environment for transfer with a particular gas appropriate for transfer; and an imprinting apparatus. Disclosed is an imprinting method of using a template having a concavo-convex pattern formed thereon, and transferring the pattern of the template by imprinting to a photocurable resin on a transfer-receiving substrate, characterized in that, in a space where the template and the photocurable resin are brought into contact, clean air is sent to the space through an air blowing port during a standby mode of not performing imprinting, and the flow rate of clean air in the space is reduced or clean air is not sent during an imprinting mode.
Public/Granted literature
- US20150224703A1 IMPRINTING METHOD AND IMPRINTING APPARATUS Public/Granted day:2015-08-13
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