Invention Grant
- Patent Title: Peeling method and manufacturing method of flexible device
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Application No.: US15490082Application Date: 2017-04-18
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Publication No.: US10279576B2Publication Date: 2019-05-07
- Inventor: Yoshiharu Hirakata
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2016-088083 20160426; JP2016-088302 20160426
- Main IPC: B32B43/00
- IPC: B32B43/00 ; B32B27/08 ; B32B37/12 ; B32B38/10

Abstract:
A peeling method is provided. In a first step, a resin layer is formed over a support substrate, openings are formed along two opposite sides of a periphery of the resin layer in a top view, an element layer is formed over the resin layer and positioned on an inner side than the openings in the top view, and the support substrate and a counter substrate are bonded to each other so that an adhesive layer is in contact with the support substrate in the openings, thereby forming a process member. In a second step, an entire surface of the process member is irradiated with light from the support substrate side. In a third step, a blade is inserted into an end portion of the process member from an interface between the support substrate and the resin layer or from the resin layer, and is made to pass through the openings.
Public/Granted literature
- US20170305134A1 PEELING METHOD AND MANUFACTURING METHOD OF FLEXIBLE DEVICE Public/Granted day:2017-10-26
Information query