Invention Grant
- Patent Title: Pressing method for surface of resin layer
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Application No.: US15908458Application Date: 2018-02-28
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Publication No.: US10279590B2Publication Date: 2019-05-07
- Inventor: Masafumi Morisue , Shinji Kishikawa , Tamaki Sato
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A. Inc., IP Division
- Priority: JP2017-040840 20170303
- Main IPC: B41J2/16
- IPC: B41J2/16 ; G03F7/00 ; B29C59/02 ; G03F7/038 ; G03F7/039 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; B30B15/02 ; B29K33/00 ; B29L31/00 ; B29K707/00 ; B29K709/02 ; B29K9/00

Abstract:
A pressing method for pressing a surface of a resin layer includes pressing a surface of a resin layer of a wafer using a pressing member, which is to be divided into a plurality of liquid ejection head chips, the wafer including a substrate and the resin layer to serve as an ejection port forming member provided on the substrate. The pressing of the surface of the resin layer is performed by positioning a structure closer to a circumference of the wafer than to an area that becomes the plurality of liquid ejection head chips on the substrate, the structure being in contact with the resin layer.
Public/Granted literature
- US20180250937A1 PRESSING METHOD FOR SURFACE OF RESIN LAYER Public/Granted day:2018-09-06
Information query
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